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I could not resist (rc3)

Published: Dec. 30, 2020, 1 p.m.

Photoresists are one of the essential ingredients for chip manufacturing and micro/nano engineering. We will show how we’re using them in a DIY Electron Beam Lithography set-up and how you’re able to cook your own cheap resists and mix your own developers. Resists? What's that?

  • What are their applications
  • How does it work (types (positive/negative), chemistry, proximity effect, dosage etc)
EBL? What's that?
  • How does it work
  • Pros & cons: comparison between EBL (slow) photolithography (fast)
  • Which resist can I use for EBL
DIY cooking of PMMA based resists
  • Comparison of different solvents
Composition of different developers
  • Comparison of different developers
Applications
  • Usage as a mask
  • Usage as a structural dielectric material
  • ...(?)
The EBL exposure process
  • simple SEM retrofitted with an EBL controller
  • The common file formats (GDSII & OASIS)
  • Scan-Gen: how to generate the proper curves for the exposure
  • Hardware: off-the-shelf embedded modules like the RedPitaya
  • Generation of different filling curve styles, calibration, compensation of the proximity effect, correction of the SEMs intrinsic parameters, dosage!
  • Fiducial detection and alignment for multi-pass/multi-layer processes
Stuff comes together
  • walk through the complete process along a simple example
More Examples Thanks & Credits Q & A about this event: https://fahrplan.events.ccc.de/rc3/2020/Fahrplan/events/11364.html